Zyvex Announces an Extremely Precise Lithography System for Use in Fabricating Quantum Processor Chips

Zyvex new product, called ZyvexLitho1TM uses scanning tunneling microscopy (STM) to achieve line widths of 0.768 nanometers which is much better than the DUV or EUV systems used in the most advanced semiconductor fabs. It uses a technology called Hydrogen Depassivation Lithography which is a form of Electron Beam Lithography (EBL) that achieves atomic resolution. Uses […]

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